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Model for Chemical vapor Deposition (CVD)
The CVD model is based on the state-of-the-art numerical methods. The CVD model is based on the state-of-the-art
numerical methods. The heat transfer module in the model includes the calculation of conjugate heat transfer and radiation heat transfer between the reactor surfaces. In addition, it has provision for
generalized boundary conditions that include convection and radiation from the outside surface of the reactor.
The computational model provides a general framework for chemical reactions. Thus,
any reaction mechanism can be included in the model. The model accounts for the variation of the physical properties with temperature and composition of the gaseous mixture.
The model has been
extensively validated by applying it to problems for which numerical and/or experimental results are available.
The present model has been used in the design and analysis of a number of CVD
reactors involving different shapes and processes.
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